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First Nano, a Division of CVD Equipment Corporation - Epitaxy Equipment / EPI Reactors / Molecular Beam Epitaxy / Atomic Layer Epitaxy Suppliers
Company : First Nano, a Division of CVD Equipment Corporation
Department : CVD Equipment Corporation
Address 1 : 1860 Smithtown Avenue
Address 2 :
City : Ronkonkoma
State : NY
Post/Zip Code : 11779
Country : United States
Phone : 631.981.7081
Fax : 631.981.7095
Email : sales@firstnano.com
Description :
**See our new Easytube™ 101 configurator - our friendly, low cost, equipment/process solution for the researcher that has a limited budget.**
First Nano, a Division of CVD Equipment Corporation, manufactures turnkey thermal CVD and PECVD systems to meet the research and production needs in nanotechnology, solar, semiconductor and MEMS industries.
Our EasyTube™ systems, used for nanomaterial growth, include:
- CVD Graphene
- Single Wall Carbon Nanotube (SWNT)
- Multi Wall Carbon Nanotube(MWNT)
- Horizontally Aligned Carbon Nanotube(HACNT)
- Vertically Aligned Carbon Nanotube (VACNT)
- Silicon/Silicon Germanium Nanowire
- ZnO and GaN Nanowire
EasyTube™ systems are also used in thin film deposition including Silicon Germanium (SiGe), amorphous Silicon, micro-crystalline Silicon, graphene, Silicon Oxide, Silicon Nitride, TCO coating on glass and much more.
We provide turnkey solutions with our EasyTube™ CVD systems, EasyGas™ cabinets, EasyPanels™, and EasyExhaust™ Gas Conditioning Systems (scrubber).
We also provide access to our Application Lab where Nano/Solar/Energy material processes can be developed in conjunction with First Nano/CVD research scientists. Please visit our Application Lab page for fees and more information.
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