NANO-UV has developed a light source for next generation lithography (NGL) based on EUV technology. With our groundbreaking technology we can supply light sources to support the deployment of EUVL for the 22nm node and beyond. This will make chips smaller and more powerful and will satisfy the need of chip manufactures for at least the next decade. NANO-UV provides the world's brightest EUV light source for EUV HVM lithography and metrology industries