With the semiconductor industry moving beyond standard silicon and further into nanoelectronics, the introduction of new materials and novel devices using innovative processing and assembly brings formidable metrology challenges. We are in an era where nanotechnology is driving us toward ever smaller, faster, cheaper, and more complex devices. Innovative metrology and characterization methods are required.

The 2009 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics is the seventh in a series that began in 1995. It emphasizes the frontiers and innovation in characterization and metrology of nanoelectronics. The proceedings for all six previous conferences were published as hardcover volumes by the American Institute of Physics, New York. The most recent proceedings, Frontiers of Characterization and Metrology for Nanoelectronics: 2007, was published in September 2007.