
City : New York, NY
Country : United States
Start Date : Monday, May 10, 2010
End Date : Wednesday, May 12, 2010
Web : http://www.sematech.org/meetings/announcements/8898/index.htm
Registration : http://www.sematech.org/meetings/announcements/8898/registration.htm
Contact Email : lithography@sematech.org
Description :
Faced with significant reductions in R&D expenditures and increasing technology demands, the challenge of staying on the current technology roadmap has never been greater. In order to continue the development of advanced lithography solutions and get them to market when needed, cost-effectiveness must be integrated at the design phase.
The SEMATECH Litho Forum will provide lithography business and R&D professionals a better understanding of the technical, logistic and economic challenges associated with getting lithography solutions to market when needed.
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