The Vistec Electron Beam Lithography Group is a world leader in the design and manufacture of electron beam lithography systems and provides leading edge technology solutions for a wide range of applications.

The Group provides systems to both to key semiconductor manufacturers as well as to Universities and Centres of Excellence. The application areas span a wide range of existing and emerging semiconductor and nanotechnology applications including silicon direct write, compound semiconductor, mask making, advanced research, integrated optics and several new emerging markets.  In addition to their production facilities in Germany and the US, the Group also maintains service and support centres in the USA, Europe, China, Taiwan and Korea.

Operating under the umbrella of the Vistec Electron Beam Lithography Group the latter consists of two companies / business units: Vistec Electron Beam GmbH, which produces Variable Shaped Beam Lithography systems– located in Jena, Germany and Vistec Lithography Inc., manufacturing Gaussian Beam Lithography systems – located in Watervliet, NY, USA.

Over the past 40 years electron beam lithography has established itself as a valuable technology used in both direct write and mask making, whereas in the past five years the latter has success­fully entered the industry sector as a direct write technology for Si-based prototype production.

Vistec’s Variable Shaped Beam systems are currently being used in this application where they hold a leading market position and have shown to be the number one in terms of throughput, accuracy and system automation.

With the ability to generate lithography of <8nm Vistec’s Gaussian Beam systems are the system of choice in a wide range of leading edge nanotechnology applications in Industry Research and Universities. Vistec’s Gaussian Beam systems are well established in the com­pound semiconductor market for R&D and specialised production areas.

The two companies (Jena /Germany and Watervliet /USA), benefit from the synergies between lea­ding edge researchers, small and mid-sized equipment and supplier companies and key semiconductor manufacturers in their neighbouring areas. They have a brilliant record as experienced developers and manufacturers of electron beam lithography systems. Their roots go back to Carl Zeiss Jena and Cambridge Instruments in the 1960s. Since then, a team of highly motivated employees, excellent researchers and engineers have worked hard to always ensure the outstanding performance of their electron-beam lithography systems, thus fulfilling the challenging requirements of our customers.